A new series of ultrahigh-resolution scanning electron microscopes provides nanometer-scale resolution and precise analysis for a wide range of samples. Initial shipments of the Nova NanoSEM 50 Series microscopes, developed by FEI Co., (Eindhoven, Netherlands) are planned for the fourth quarter of this year.
The instrument combines imaging capabilities down to the nanometer level, a high beam current for fast and precise analysis, and low vacuum capability to extend the range of sample types and minimise preparation requirements, according to the company. In low vacuum, the Nova NanoSEM can examine highly insulating samples, up to nearly the same resolution that can be achieved in high vacuum, with little or no preparation, eliminating artifacts and saving time.
The Nova NanoSEM 450 is suited for advanced material science applications, whereas the Nova NanoSEM 650 offers a high-precision 150-mm piezo-electric stage for fast, precise navigation, providing 100% coverage of 6-in. wafers or masks, and substatial coverage of 8-in. samples. Both instruments provide 1 nm resolution at 15 kV, 1.4 nm at 1 kV and beam currents up to 200 nA.
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